High Purity Metal Sputtering Target

SKNMT supply most of the metal sputtering targets materials on the periodic table including rare earth metals. The production technology in metal targets generally use is vacuum melting and hot-pressed sintering. By controlling the technical specifications of the process of forging, rolling and annealing, the finished sputtering target has the characteristics of high density, low gas content, uniform internal structure, the end user can obtain constant erosion rates and high pure and homogeneous thin films during the PVD process.

For your custom R&D, if you do not find the sputtering target as per your need from the list. Contact us via email at sales@sknovelmaterials.com or call us at +91-9015852036. 

For product quotation, please email: sales@sknovelmaterials.com